Impact of curing kinetics and materials properties on imprint characteristics of resists for UV nano-imprint lithography

Impact of curing kinetics and materials properties on imprint characteristics of resists for UV nano-imprint lithography

Author(s):

F. A. Houle ( IBM Almaden Research Ctr. (USA) )

A. Fornof ( IBM Almaden Research Ctr. (USA) )

R. Sooriyakumaran ( IBM Almaden Research Ctr. (USA) )

H. Truong ( IBM Almaden Research Ctr. (USA) )

D. C. Miller ( IBM Almaden Research Ctr. (USA) )

M. I. Sanchez ( IBM Almaden Research Ctr. (USA) )

B. Davis ( IBM Almaden Research Ctr. (USA) )

T. Magbitang ( IBM Almaden Research Ctr. (USA) )

R. D. Allen ( IBM Almaden Research Ctr. (USA) )

M. W. Hart ( IBM Almaden Research Ctr. (USA) )

G. Dubois ( IBM Almaden Research Ctr. (USA) )

6 more

Publication title:

Advances in resist materials and processing technology XXIV

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6519

Pub. Year:

2007

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819466389 [0819466387]

Language:

English

Call no.:

P63600/6519

Type:

Conference Proceedings

Details

TDL ID:	ZA00046826
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Advances in Resist Materials and Processing Technology
Conf. info. (Number):	2007 : 24th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2007.02.26-2007.02.28

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