A novel plasma-assisted shrink process to enlarge process windows of narrow trenches and contacts for 45-nm node applications and beyond
- Author(s):
M. O. de Beeck ( IMEC (Belgium) ) J. Versluijs ( IMEC (Belgium) ) Z. Tokei ( IMEC (Belgium) ) S. Demuynck ( IMEC (Belgium) ) J. D. Marneffe ( IMEC (Belgium) ) W. Boullart ( IMEC (Belgium) ) S. Vanhaelemeersch ( IMEC (Belgium) ) H. Zhu ( Lam Research Corp. (USA) ) P. Cirigliano ( Lam Research Corp. (USA) ) E. Pavel ( Lam Research Corp. (USA) ) R. Sadjadi ( Lam Research Corp. (USA) ) J. Kim ( Lam Research Corp. (USA) ) - Publication title:
- Advances in resist materials and processing technology XXIV
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6519
- Pub. Year:
- 2007
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819466389 [0819466387]
- Language:
- English
- Call no.:
- P63600/6519
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
30nm half-pitch metal patterning using Moti CD shrink technique and double patterning
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
8
Conference Proceedings
Challenges for the quality control of assist features for 45nm node technology and beyond
Society of Photo-optical Instrumentation Engineers |
3
Conference Proceedings
Manufacturability issues with double patterning for 50-nm half-pitch single damascene applications using RELACS shrink and corresponding OPC
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
4
Conference Proceedings
Optimization of resist shrink techniques for contact hole and metal trench ArF lithography at the 90-nm technology node
SPIE - The International Society of Optical Engineering |
10
Conference Proceedings
Double patterning combined with shrink technique to extend ArF lithography for contact holes to 22nm node and beyond
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
11
Conference Proceedings
Issues and Optimization of Millisecond Anneal Process for 45 nm Node and Beyond
Materials Research Society |
Electrochemical Society |
Society of Photo-optical Instrumentation Engineers |