High-performance 193nm photoresists based on fluorosulfonamide
- Author(s):
W. Li ( IBM Semiconductor Research and Development Ctr. (USA) ) K. Chen ( IBM Semiconductor Research and Development Ctr. (USA) ) R. Kwong ( IBM Semiconductor Research and Development Ctr. (USA) ) M. C. Lawson ( IBM Semiconductor Research and Development Ctr. (USA) ) M. Khojasteh ( IBM Semiconductor Research and Development Ctr. (USA) ) I. Popova ( IBM Semiconductor Research and Development Ctr. (USA) ) P. R. Varanasi ( IBM Semiconductor Research and Development Ctr. (USA) ) T. Shimokawa ( JSR Corp. (Japan) ) Y. Yamaguchi ( JSR Corp. (Japan) ) S. Kusumoto ( JSR Corp. (Japan) ) M. Sugiura ( JSR Corp. (Japan) ) T. Kawakami ( JSR Corp. (Japan) ) M. Slezak ( JSR Micro, Inc. (USA) ) G. Dabbagh ( JSR Micro, Inc. (USA) ) Z. Liu ( JSR Micro, Inc. (USA) ) - Publication title:
- Advances in resist materials and processing technology XXIV
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6519
- Pub. Year:
- 2007
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819466389 [0819466387]
- Language:
- English
- Call no.:
- P63600/6519
- Type:
- Conference Proceedings
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