Emerging patterning materials: trends, challenges, and opportunities in patterning and materials by design

Emerging patterning materials: trends, challenges, and opportunities in patterning and materials by design

Author(s):: D. J. C. Herr ( Semiconductor Research Corp. (USA) )
Publication title:: Advances in resist materials and processing technology XXIV
Title of ser.:: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:: 6519
Pub. Year:: 2007
Pub. info.:: Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:: 0277786X
ISBN:: 9780819466389 [0819466387]
Language:: English
Call no.:: P63600/6519
Type:: Conference Proceedings

Details

TDL ID:	ZA00046826
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Advances in Resist Materials and Processing Technology
Conf. info. (Number):	2007 : 24th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2007.02.26-2007.02.28

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