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Study on micro-bubble defect induced by RRC coating

Author(s):
  • Y. Liu ( United Microelectronics Corp. (Taiwan) )
  • W. Liao ( United Microelectronics Corp. (Taiwan) )
  • H. Lin ( United Microelectronics Corp. (Taiwan) )
  • C. Chen ( United Microelectronics Corp. (Taiwan) )
  • C. C. Huang ( United Microelectronics Corp. (Taiwan) )
Publication title:
Metrology, inspection, and process control for microlithography XXI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6518
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466372 [0819466379]
Language:
English
Call no.:
P63600/6518
Type:
Conference Proceedings

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