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Enhanced hole shape of flash devices in ArF lithography by eliptical mask bias technique

Author(s):
Y. Jeon ( DongbuElectronics (South Korea) )
S. Jun ( DongbuElectronics (South Korea) )
J. Kang ( DongbuElectronics (South Korea) )
S. Lee ( DongbuElectronics (South Korea) )
J. Kim ( DongbuElectronics (South Korea) )
K. Kim ( DongbuElectronics (South Korea) )
1 more
Publication title:
Metrology, inspection, and process control for microlithography XXI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6518
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466372 [0819466379]
Language:
English
Call no.:
P63600/6518
Type:
Conference Proceedings

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