Advances in CD-AFM scan algorithm technology enable improved CD metrology

Advances in CD-AFM scan algorithm technology enable improved CD metrology

Author(s):

L. Mininni ( Veeco Instruments (USA) )
J. Foucher ( CEA/LETI/MINATEC (France) )
P. Faurie ( CEA/LETI/MINATEC (France) )

Publication title:

Metrology, inspection, and process control for microlithography XXI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6518

Pub. Year:

2007

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819466372 [0819466379]

Language:

English

Call no.:

P63600/6518

Type:

Conference Proceedings

Details

TDL ID:	ZA00046825
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Metrology, Inspection, and Process Control for Microlithography
Conf. info. (Number):	2007 : 21st
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2007.02.26-2007.03.01

Similar Items:

1 Conference Proceedings Improving sidewall profile metrology with enhanced 3D-AFM T. Bao, L. Mininni, D. Dawson Society of Photo-optical Instrumentation Engineers	7 Conference Proceedings Landing energy influence on CD-SEM measurement precision and accuracy [6152-187] Fabre, A. L., Foucher, J., Poulingue, M., Fabre, P., Sundaram, G. SPIE - The International Society of Optical Engineering
2 Conference Proceedings CD-AFM versus CD-SEM for resist LER and LWR measurements [6152-31] Foucher, J., Fabre, A. L., Gautier, P. SPIE - The International Society of Optical Engineering	8 Conference Proceedings CD SEM metrology macro CD technology: beyond the average Armellin, L.-P., Dureuil, V., Guillaume, O., Alet, P., Eichelberger, B., Egreteau, M., Polli, M., Dinu, B. SPIE - The International Society of Optical Engineering
3 Conference Proceedings TEM validation of CD AFM image reconstruction G. A. Dahlen, L. Mininni, M. Osborn, H. Liu, J. R. Osborne, B. Tracy, A. del Rosario SPIE - The International Society of Optical Engineering	9 Conference Proceedings Cluster optimization to improve CD control as an enabler for double patterning L. Tedeschi, C. Rosslee, D. Laidler, P. Leray, K. D'havé Society of Photo-optical Instrumentation Engineers
4 Conference Proceedings The CD metrology perspectives and future trends J. Foucher, E. Pargon, M. Martin, V. Farys, S. Bécu Society of Photo-optical Instrumentation Engineers	10 Conference Proceedings Measurement of a CD and sidewall angle artifact with two-dimensional CD AFM metrology Dixson,R., Sullivan,N.T., Schneir,J., McWaid,T.H., Tsai,V.W., Prochazka,J.J., Young,M. SPIE-The International Society for Optical Engineering
5 Conference Proceedings Impact of acid diffusion length on resist LER and LWR measured by CD-AFM and CD-SEM J. Foucher, A. Pikon, C. Andes, J. Thackeray SPIE - The International Society of Optical Engineering	11 Conference Proceedings Technology enablers for improved aerospace x-ray NDE Strabel,G., Ross,J., Graham,L., Smith,K. SPIE-The International Society for Optical Engineering
6 Conference Proceedings MECHANISM OF INTERDIFFUSION IN Hg1-XXXTe/CdTe SUPERLATTICES (X =Cd, Mn, AND Zn) Staudenmann, J. -L., Knox, R. D., Faurie, J. -P. Materials Research Society	12 Conference Proceedings Improved CD and overlay metrology using an optical Fourier transform instrument Dallas, A. J., Ding, L., Exley, J., Joriman, J., Hoang, B., Parsons, J., Seguin, K., Zastera, D. SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12