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New inline AFM metrology tool suited for LSI manufacturing at the 45-nm node and beyond

Author(s):
M. Edamura ( Hitachi Kenki FineTech Co., Ltd. (Japan) )
Y. Kunitomo ( Hitachi Kenki FineTech Co., Ltd. (Japan) )
T. Morimoto ( Hitachi Kenki FineTech Co., Ltd. (Japan) )
S. Sekino ( Hitachi Kenki FineTech Co., Ltd. (Japan) )
T. Kurenuma ( Hitachi Kenki FineTech Co., Ltd. (Japan) )
Y. Kembo ( Hitachi Kenki FineTech Co., Ltd. (Japan) )
M. Watanabe ( Hitachi, Ltd. (Japan) )
S. Baba ( Hitachi, Ltd. (Japan) )
K. Hidaka ( Hitachi, Ltd. (Japan) )
4 more
Publication title:
Metrology, inspection, and process control for microlithography XXI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6518
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466372 [0819466379]
Language:
English
Call no.:
P63600/6518
Type:
Conference Proceedings

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