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MacroCD contact ellipticity measurement for lithography tool qualification

Author(s):
I. Englard ( Applied Materials Europe (Netherlands) )
E. van Setten ( ASML Netherlands B.V. (Netherlands) )
G. Janssen ( ASML Netherlands B.V. (Netherlands) )
P. Vanoppen ( ASML Netherlands B.V. (Netherlands) )
I. Minnaert-Janssen ( ASML Netherlands B.V. (Netherlands) )
F. Duray ( ASML Netherlands B.V. (Netherlands) )
O. Adan ( Applied Materials Europe (Israel) )
A. Moran ( Applied Materials Europe (Israel) )
L. Gershtein ( Applied Materials Europe (Israel) )
R. Peltinov ( Applied Materials Europe (Israel) )
5 more
Publication title:
Metrology, inspection, and process control for microlithography XXI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6518
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466372 [0819466379]
Language:
English
Call no.:
P63600/6518
Type:
Conference Proceedings

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