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Major trends in extending CD-SEM utility

Author(s):
B. Bunday ( International SEMATECH Manufacturing Initiative (USA) )
J. Allgair ( International SEMATECH Manufacturing Initiative (USA) )
K. Yang ( Hitachi High-Technologies Corp. (Japan) )
S. Koshihara ( Hitachi High-Technologies Corp. (Japan) )
H. Morokuma ( Hitachi High-Technologies Corp. (Japan) )
A. Danilevsky ( Hitachi High Technologies America, Inc. (USA) )
C. Parker ( Hitachi High Technologies America, Inc. (USA) )
L. Page ( Hitachi High Technologies America, Inc. (USA) )
3 more
Publication title:
Metrology, inspection, and process control for microlithography XXI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6518
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466372 [0819466379]
Language:
English
Call no.:
P63600/6518
Type:
Conference Proceedings

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