Die-to-database verification tool for detecting CD errors, which are caused by OPC features, by using mass gate measurement and layout information

Die-to-database verification tool for detecting CD errors, which are caused by OPC features, by using mass gate measurement and layout information

Author(s):

T. Kitamura ( NanoGeometry Research, Inc. (Japan) )

T. Hasebe ( NanoGeometry Research, Inc. (Japan) )

K. Kubota ( NanoGeometry Research, Inc. (Japan) )

F. Sakai ( NanoGeometry Research, Inc. (Japan) )

S. Nakazawa ( NanoGeometry Research, Inc. (Japan) )

D. Lin ( NanoGeometry Research, Inc. (Japan) )

M. J. Hoffman ( NanoGeometry Research, Inc. (Japan) )

M. Yamamoto ( NanoGeometry Research, Inc. (Japan) )

M. Inoue ( Topcon Corp. (Japan) )

4 more

Publication title:

Metrology, inspection, and process control for microlithography XXI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6518

Pub. Year:

2007

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819466372 [0819466379]

Language:

English

Call no.:

P63600/6518

Type:

Conference Proceedings

Details

TDL ID:	ZA00046825
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Metrology, Inspection, and Process Control for Microlithography
Conf. info. (Number):	2007 : 21st
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2007.02.26-2007.03.01

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