Say good-bye to DOF: statistical process window analysis with inline lithographic process variations

Say good-bye to DOF: statistical process window analysis with inline lithographic process variations

Author(s):

W. Zhou ( Chartered Semiconductor Manufacturing Ltd. (Singapore) )
M. Tang ( Chartered Semiconductor Manufacturing Ltd. (Singapore) )
H. Koh ( Chartered Semiconductor Manufacturing Ltd. (Singapore) )
M. Zhou ( Chartered Semiconductor Manufacturing Ltd. (Singapore) )

Publication title:

Metrology, inspection, and process control for microlithography XXI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6518

Pub. Year:

2007

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819466372 [0819466379]

Language:

English

Call no.:

P63600/6518

Type:

Conference Proceedings

Details

TDL ID:	ZA00046825
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Metrology, Inspection, and Process Control for Microlithography
Conf. info. (Number):	2007 : 21st
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2007.02.26-2007.03.01

Similar Items:

1 Conference Proceedings Lithographic process window analysis by statistical means Bourov, A., Postnikov, S.V., Lucas, K. SPIE-The International Society for Optical Engineering	7 Conference Proceedings Lithography process window analysis with calibrated model Zhou, W., Yu, J., Lo, J., Liu, J. SPIE - The International Society of Optical Engineering
2 Conference Proceedings A study of defect measurement techniques and corresponding effects on the lithographic process window for a 193-nm EPSM photomask Nhiev, A.B., Hickethier, J., Zhou, H., Hutchinson, T.A., Howard, W., Ahmadian, M. SPIE - The International Society of Optical Engineering	8 Conference Proceedings Effects of DUV resist sensitivities on lithographic process window Kemp,K.G., Williams,D.J., Cayton,J.W., Steege,P., Slonaker,S., Elliott,R.C. SPIE-The International Society for Optical Engineering
3 Conference Proceedings Advanced lithography parameters extraction by using scatterometry system W. Zhou, M. Tang, H. Koh, M. Zhou SPIE - The International Society of Optical Engineering	9 Conference Proceedings Effects of DUV resist sensitivities on lithographic process window Kemp,K.G., Williams,D.J., Cayton,J.W., Steege,P., Slonaker,S., Elliott,R.C. SPIE-The International Society for Optical Engineering
4 Conference Proceedings High-spatial-resolution soliton DOFS for smart structures Song,M., Tang,W., Zhou,W. SPIE-The International Society for Optical Engineering	10 Conference Proceedings Advanced lithography parameters extraction by using scatterometry system: part II W. Zhou, M. Hsieh, H. Koh, M. Zhou Society of Photo-optical Instrumentation Engineers
5 Conference Proceedings Statistical analysis of CD-SEM measurement and process control in the indistinguishable multi-process patterns [6152-100] Yang, D. S., Jung, M. H., Lee, Y. M., Koh, C. W., Yeo, G. S., Woo, S. G., Cho, H. K., Moon, J. T. SPIE - The International Society of Optical Engineering	11 Conference Proceedings Process window metrology Ausschnitt,C.P., Chu,W., Hadel,L.M., Ho,H., Talvi,P. SPIE - The International Society for Optical Engineering
6 Conference Proceedings Optimization of E th method for DUV process inline monitor Zhou, W.Z., Chen, H., Ng, T.H., Lim, H.K. SPIE-The International Society for Optical Engineering	12 Conference Proceedings Robust approach to determine the optimized illumination condition using process window analysis Y. -J. Chun, S. -W. Lee, S. Lee, Y. -M. Lee, S. Suh, S. -J. Lee, H. -K. Cho, H. -J. Park, B. Falch SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12