Blank Cover Image

In-chip overlay metrology of 45nm and 55nm processes

Author(s):
Y. S. Ku ( Industrial Technology Research Institute (Taiwan) )
C. H. Tung ( Industrial Technology Research Institute (Taiwan) )
Y. P. Li ( Industrial Technology Research Institute (Taiwan) )
H. L. Pang ( Industrial Technology Research Institute (Taiwan) )
C. M. Ke ( Taiwan Semiconductor Manufacturing Co. (Taiwan) )
Y. H. Wang ( Taiwan Semiconductor Manufacturing Co. (Taiwan) )
D. C. Huang ( Taiwan Semiconductor Manufacturing Co. (Taiwan) )
N. P. Smith ( Nanometrics Inc. (Taiwan) )
L. Binns ( Nanometrics Inc. (United Kingdom) )
4 more
Publication title:
Metrology, inspection, and process control for microlithography XXI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6518
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466372 [0819466379]
Language:
English
Call no.:
P63600/6518
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings In-chip overlay metrology for 45nm processes

Y. S. Ku, H. L. Pang, N. P. Smith, L. Binns

SPIE - The International Society of Optical Engineering
7 Conference Proceedings Overlay metrology at the crossroads

N. P. Smith, L. A. Binns, A. Plambeck, K. Heidrich

Society of Photo-optical Instrumentation Engineers
2 Conference Proceedings In-chip overlay metrology [6152-40]

Ku, Y. S., Tung, C. H., Li, Y. P., Pang, H. L., Smith, N. P., Binns, L., Rigden, T., Reynolds, G., Fink, H.

SPIE - The International Society of Optical Engineering
8 Conference Proceedings Overlay metrology tool calibration using blossom

L. A. Binns, N. P. Smith, P. Dasari

Society of Photo-optical Instrumentation Engineers
3 Conference Proceedings Using in-chip overlay metrology

S. Girol-Gunia, B. Schulz, N. Smith, L. Binns

Society of Photo-optical Instrumentation Engineers
9 Conference Proceedings Effects of illumination wavelength on the accuracy of optical overlay metrology

Han,J.-S., Kim,H., Nam,J.-L., Han,M.-S., Lim,S.-K., Yanowitz,S.D., Smith,N.P., Smout,A.M.C.

SPIE-The International Society for Optical Engineering
4 Conference Proceedings 45nm design rule in-die overlay metrology on immersion lithography processes

Y. Shih, G. K. Huang, C. Yu, M. Adel, C. K. Huang, P. Izikson, E. Kassel, S. Mathur, C. Huang, D. Tien, Y. Avrahamov

SPIE - The International Society of Optical Engineering
10 Conference Proceedings Application of scatterometry for CD and profile metrology in 193-nm lithography process development

Chen, L.-J., Ke, C.-M., Yu, S.S., Gau, T.-S., Chen, P., Ku, Y.-C., Lin, B.J., Engelhard, D., Hetzer, D., Yang, J.Y., …

SPIE-The International Society for Optical Engineering
5 Conference Proceedings Blossom overlay metrology implementation

C. P. Ausschnitt, W. Chu, D. Kolor, J. Morillo, J. L. Morningstar, W. Muth, C. Thomison, R. J. Yerdon, L. A. Binns, P. …

SPIE - The International Society of Optical Engineering
11 Conference Proceedings Multi-layer overlay metrology [6152-36]

Ausschnitt, C. P., Morningstar, J., Muth, W., Schneider, J., Yerdon, R. J., Binns, L. A., Smith, N. P.

SPIE - The International Society of Optical Engineering
6 Conference Proceedings Overlay metrology tool calibration

L. A. Binns, P. Dasari, N. P. Smith, G. Ananew, H. Fink, C. P. Ausschnitt, J. Morningstar, C. Thomison, R. J. Yerdon

SPIE - The International Society of Optical Engineering
12 Conference Proceedings 90-nm lithography process characterization using ODP scatterometry technology

Ke, C.-M., Yu, S.-S., Wang, Y.-H., Chou, Y.-J., Chen, J.-H., Lee, B.-H., Chu, H.-Y., Lin, H.-T., Gau, T.-S., Lin, C.-H., …

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12