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Etch process monitoring by electron beam wafer inspection

Author(s):
L. Lin ( Powerchip Semiconductor Co. (Taiwan) )
J. Chen ( Powerchip Semiconductor Co. (Taiwan) )
W. Wong ( Powerchip Semiconductor Co. (Taiwan) )
M. McCord ( KLA-Tencor (USA) )
A. Tsai ( KLA-Tencor (USA) )
S. Oestreich ( KLA-Tencor (USA) )
I. De ( KLA-Tencor (USA) )
J. Lauber ( KLA-Tencor (USA) )
A. Kang ( KLA-Tencor (USA) )
4 more
Publication title:
Metrology, inspection, and process control for microlithography XXI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6518
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466372 [0819466379]
Language:
English
Call no.:
P63600/6518
Type:
Conference Proceedings

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