SEM metrology for advanced lithographies
- Author(s):
B. Bunday ( International SEMATECH Manufacturing Initiative (USA) ) J. Allgair ( International SEMATECH Manufacturing Initiative (USA) ) B. J. Rice ( SEMATECH (USA) ) J. Byers ( SEMATECH (USA) ) Y. Avitan ( Applied Materials (Israel) ) R. Peltinov ( Applied Materials (Israel) ) M. Bar-zvi ( Applied Materials (Israel) ) O. Adan ( Applied Materials (Israel) ) J. Swyers ( Applied Materials (USA) ) R. Z. Shneck ( Ben Gurion Univ. of the Negev (Israel) ) - Publication title:
- Metrology, inspection, and process control for microlithography XXI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6518
- Pub. Year:
- 2007
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819466372 [0819466379]
- Language:
- English
- Call no.:
- P63600/6518
- Type:
- Conference Proceedings
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