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Characterization of bending CD errors induced by resist trimming in 65 nm node and beyond

Author(s):
Y. Gu ( Texas Instruments, Inc. (USA) )
J. B. Friedmann ( Texas Instruments, Inc. (USA) )
V. Ukraintsev ( Texas Instruments, Inc. (USA) )
G. Zhang ( Texas Instruments, Inc. (USA) )
T. Wolf ( Texas Instruments, Inc. (USA) )
T. Lii ( Texas Instruments, Inc. (USA) )
R. Jackson ( Texas Instruments, Inc. (USA) )
2 more
Publication title:
Metrology, inspection, and process control for microlithography XXI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6518
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466372 [0819466379]
Language:
English
Call no.:
P63600/6518
Type:
Conference Proceedings

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