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Line edge roughness characterization of sub-50nm structures using CD-SAXS: round-robin benchmark results

Author(s):
C. Wang ( National Institute of Standards and Technology (USA) )
R. L. Jones ( National Institute of Standards and Technology (USA) )
E. K. Lin ( National Institute of Standards and Technology (USA) )
W. Wu ( National Institute of Standards and Technology (USA) )
J. S. Villarrubia ( National Institute of Standards and Technology (USA) )
K. Choi ( National Institute of Standards and Technology (USA) )
J. S. Clarke ( Intel Corp. (USA) )
B. J. Rice ( Intel Corp. (USA) )
M. Leeson ( Intel Corp. (USA) )
J. Roberts ( Intel Corp. (USA) )
R. Bristol ( Intel Corp. (USA) )
B. Bunday ( International SEMATECH Manufacturing Initiative (USA) )
7 more
Publication title:
Metrology, inspection, and process control for microlithography XXI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6518
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466372 [0819466379]
Language:
English
Call no.:
P63600/6518
Type:
Conference Proceedings

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