Transition from precise to accurate critical dimension metrology

Transition from precise to accurate critical dimension metrology

Author(s):

V. A. Ukraintsev ( Texas Instruments, Inc. (USA) )
M. C. Tsai ( Texas Instruments, Inc. (USA) )
T. Lii ( Texas Instruments, Inc. (USA) )
R. A. Jackson ( Texas Instruments, Inc. (USA) )

Publication title:

Metrology, inspection, and process control for microlithography XXI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6518

Pub. Year:

2007

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819466372 [0819466379]

Language:

English

Call no.:

P63600/6518

Type:

Conference Proceedings

Details

TDL ID:	ZA00046825
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Metrology, Inspection, and Process Control for Microlithography
Conf. info. (Number):	2007 : 21st
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2007.02.26-2007.03.01

Similar Items:

1 Conference Proceedings Characterization of bending CD errors induced by resist trimming in 65 nm node and beyond Y. Gu, J. B. Friedmann, V. Ukraintsev, G. Zhang, T. Wolf, T. Lii, R. Jackson SPIE - The International Society of Optical Engineering	7 Conference Proceedings Accurate and traceable dimensional metrology with a reference CD-SEM A. E. Vladár, J. S. Villarrubia, P. Cizmar, M. Oral, M. T. Postek Society of Photo-optical Instrumentation Engineers
2 Conference Proceedings LithoCell-integrated critical dimension metrology Stirton, J.B., Miller, C.W., Viswanathan, A., Miyagi, M., Lane, L., Laughery, M.A., Parikh, T., Chan, K.C., Sezginer, A. SPIE-The International Society for Optical Engineering	8 Conference Proceedings Redefining critical in critical dimension metrology Askary,F., Sullivan,N.T. SPIE-The International Society for Optical Engineering
3 Conference Proceedings Accurate dimensional metrology with atomic force microscopy Dixson,R.G., Koning,R., Fu,J., Vorburger,T.V., Renegar,B.T. SPIE - The International Society for Optical Engineering	9 Conference Proceedings Measurement of a CD and sidewall angle artifact with two-dimensional CD AFM metrology Dixson,R., Sullivan,N.T., Schneir,J., McWaid,T.H., Tsai,V.W., Prochazka,J.J., Young,M. SPIE-The International Society for Optical Engineering
4 Conference Proceedings High-accuracy critical-dimension metrology using a scanning electron microscope Lowney,J.R., Vladar,A.E., Postek,M.T. SPIE-The International Society for Optical Engineering	10 Conference Proceedings Precise control of critical dimension shrinkage and enlargement by in-situ polysilicon etch Linliu,K., Kuo,M.-R. SPIE - The International Society for Optical Engineering
5 Conference Proceedings Fundamental limits of optical critical dimension metrology: a simulation study R. Silver, T. Germer, R. Attota, B. M. Barnes, B. Bunday, J. Allgair, E. Marx, J. Jun SPIE - The International Society of Optical Engineering	11 Conference Proceedings Toward accurate linewidth metrology using atomic force microscopy and tip characterization Dixson,R., Schneir,J., McWaid,T.H., Sullivan,N.T., Tsai,V.W., Zaidi,S.H., Brueck,S.R.J. SPIE-The International Society for Optical Engineering
6 Conference Proceedings A new critical dimension metrology for chrome-on-glass substrates based on S-parameter measurements extracted from coplanar waveguide test structures [6349-157] Nwokoye, C. A., Zaghloul, M., Cresswell, M. W., Allen, R. A., Murabito, C. E. SPIE - The International Society of Optical Engineering	12 Conference Proceedings Step-height metrology for data storage applications Kdning,R., Dixson,R.C., Fu,J., Renegar,B.T., Vorburger,T.V., Tsai,V.W., Postek,M.T.,Jr. SPIE - The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12