Metrology challenges for advanced lithography techniques
- Author(s):
I. Englard ( Applied Materials Europe (Netherlands) ) P. Vanoppen ( ASML Netherlands (Netherlands) ) J. Finders ( ASML Netherlands (Netherlands) ) I. Minnaert-Janssen ( ASML Netherlands (Netherlands) ) F. Duray ( ASML Netherlands (Netherlands) ) J. Meessen ( ASML Netherlands (Netherlands) ) G. Janssen ( ASML Netherlands (Netherlands) ) O. Adan ( Applied Materials Europe (Israel) ) L. Gershtein ( Applied Materials Europe (Israel) ) R. Peltinov ( Applied Materials Europe (Israel) ) C. Masia ( Applied Materials Europe (Israel) ) R. Piech ( Applied Materials Europe (Netherlands) ) - Publication title:
- Metrology, inspection, and process control for microlithography XXI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6518
- Pub. Year:
- 2007
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819466372 [0819466379]
- Language:
- English
- Call no.:
- P63600/6518
- Type:
- Conference Proceedings
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