Fundamental limits of optical critical dimension metrology: a simulation study

Author(s):

R. Silver ( National Institute of Standards and Technology (USA) )

T. Germer ( National Institute of Standards and Technology (USA) )

R. Attota ( National Institute of Standards and Technology (USA) )

B. M. Barnes ( National Institute of Standards and Technology (USA) )

B. Bunday ( International Sematech Manufacturing Initiative (USA) )

J. Allgair ( International Sematech Manufacturing Initiative (USA) )

E. Marx ( National Institute of Standards and Technology (USA) )

J. Jun ( National Institute of Standards and Technology (USA) )

3 more

Publication title:

Metrology, inspection, and process control for microlithography XXI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6518

Pub. Year:

2007

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819466372 [0819466379]

Language:

English

Call no.:

P63600/6518

Type:

Conference Proceedings