Improved overlay control through automated high order compensation
- Author(s):
S. Wakamoto ( Nikon Corp. (Japan) ) Y. Ishii ( Nikon Corp. (Japan) ) K. Yasukawa ( Nikon Corp. (Japan) ) A. Sukegawa ( Nikon Corp. (Japan) ) S. Maejima ( Renesas Technology Corp. (Japan) ) A. Kato ( KLA-Tencor Japan, Ltd. (Japan) ) J. C. Robinson ( KLA-Tencor Corp. (USA) ) B. J. Eichelberger ( KLA-Tencor Corp. (USA) ) P. Izikson ( KLA-Tencor Corp. (Israel) ) M. Adel ( KLA-Tencor Corp. (Israel) ) - Publication title:
- Metrology, inspection, and process control for microlithography XXI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6518
- Pub. Year:
- 2007
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819466372 [0819466379]
- Language:
- English
- Call no.:
- P63600/6518
- Type:
- Conference Proceedings
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