Methodology to set up accurate OPC model using optical CD metrology and atomic force microscopy

Methodology to set up accurate OPC model using optical CD metrology and atomic force microscopy

Author(s):

Y. Shim ( DongbuElectronics (South Korea) )
J. Kang ( DongbuElectronics (South Korea) )
S. Lee ( DongbuElectronics (South Korea) )
J. Kim ( DongbuElectronics (South Korea) )
K. Kim ( DongbuElectronics (South Korea) )

Publication title:

Metrology, inspection, and process control for microlithography XXI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6518

Pub. Year:

2007

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819466372 [0819466379]

Language:

English

Call no.:

P63600/6518

Type:

Conference Proceedings

Details

TDL ID:	ZA00046825
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Metrology, Inspection, and Process Control for Microlithography
Conf. info. (Number):	2007 : 21st
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2007.02.26-2007.03.01

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