Setting MRC rules: balancing inspection capabilities, defect sensitivity, and OPC

Setting MRC rules: balancing inspection capabilities, defect sensitivity, and OPC

Author(s):

I. Stobert ( IBM Semiconductor Research and Development Ctr (USA) )
J. Bruce ( IBM Semiconductor Research and Development Ctr (USA) )
M. Gheith ( Mentor Graphics Corp. (USA) )
A. Seoud ( Mentor Graphics Corp. (USA) )

Publication title:

Metrology, inspection, and process control for microlithography XXI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6518

Pub. Year:

2007

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819466372 [0819466379]

Language:

English

Call no.:

P63600/6518

Type:

Conference Proceedings

Details

TDL ID:	ZA00046825
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Metrology, Inspection, and Process Control for Microlithography
Conf. info. (Number):	2007 : 21st
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2007.02.26-2007.03.01

Similar Items:

1 Conference Proceedings Improvements in post-OPC data constraints for enhanced process corrections [6154-134] Burns, R. L., Cui, Y., Zhao, Z., Stobert, I., LaCour, P., Yehia, A., Madkour, K., Gheith , M., Seoud, A. SPIE - The International Society of Optical Engineering	7 Conference Proceedings Characterization of inspection sensitivity on advanced OPC reticles Zurbrick,L.S., Straub,J.A., Vacca,A. SPIE - The International Society for Optical Engineering
2 Conference Proceedings Impact of transmitted and reflected light inspection on mask inspectability, defect sensitivity, and mask design rule restrictions Y. Kodera, K. Badger, E. Gallagher, S. Akima, M. Lawliss, H. Ikeda, I. Stobert, Y. Kikuchi SPIE - The International Society of Optical Engineering	8 Conference Proceedings The effect of OPC optical and resist model parameters on the model accuracy, run time, and stability [6349-76] Abdo, A., Fathy, R., Seoud, A., Oberschmidt, J., Mansfield, S., Talbi, M. SPIE - The International Society of Optical Engineering
3 Conference Proceedings The effect of the OPC parameters on the performance of the OPC model A. Abdo, A. Seoud, A. Wei, I. Stobert, A. Leslie Society of Photo-optical Instrumentation Engineers	9 Conference Proceedings Defect inspection capability for advanced OPC photomasks Straub,J.A., Vacca,A., Zurbrick,L.S. SPIE - The International Society for Optical Engineering
4 Conference Proceedings Flexible MRC rules for OPC Cobb, N. B., Miloslavsky, E., Lippincott, G. SPIE - The International Society of Optical Engineering	10 Conference Proceedings Mask manufacturing rules checking (MRC) as a DFM strategy P. Buck, R. Gladhill, J. Straub SPIE - The International Society of Optical Engineering
5 Conference Proceedings Impact of the OMOG substrate on 32 nm mask OPC inspectability, defect sensitivity, and mask design rule restrictions K. Badger, Y. Kodera, E. Gallagher, M. Lawliss Society of Photo-optical Instrumentation Engineers	11 Conference Proceedings Optimizing models based OPC fragmentation using genetic algorithms D. A. Dipaola, I. Stobert Society of Photo-optical Instrumentation Engineers
6 Conference Proceedings Real-time VT5 model coverage calculations during OPC simulations I. Graur, S. Mansfield, M. Gheith, M. Al-Imam SPIE - The International Society of Optical Engineering	12 Conference Proceedings Intelligent ground-rule-based inspection of OPC masks Bishop,R.P. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12