Focus and dose controls, and their application in lithography

Author(s):

• H. Ina ( Canon, Inc. (Japan) )
• K. Sentoku ( Canon, Inc. (Japan) )
• S. Oishi ( Canon, Inc. (Japan) )
• T. Miyashita ( Canon, Inc. (Japan) )
• T. Matsumoto ( Canon, Inc. (Japan) )

Publication title:

Metrology, inspection, and process control for microlithography XXI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6518

Pub. Year:

2007

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819466372 [0819466379]

Language:

English

Call no.:

P63600/6518

Type:

Conference Proceedings