Long-term durability of a Ru capping layer for EUVL projection optics by introducing ethanol

Long-term durability of a Ru capping layer for EUVL projection optics by introducing ethanol

Author(s):

Y. Kakutani ( Univ. of Hyogo (Japan) )

M. Niibe ( Univ. of Hyogo (Japan) )

Y. Gomei ( Canon Inc. (Japan) )

H. Takase ( Extreme Ultraviolet Lithography System Development Association (Japan) )

S. Terashima ( Extreme Ultraviolet Lithography System Development Association (Japan) )

S. Matsunari ( Extreme Ultraviolet Lithography System Development Association (Japan) )

T. Aoki ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Y. Fukuda ( Extreme Ultraviolet Lithography System Development Association (Japan) )

3 more

Publication title:

Emerging lithographic technologies XI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6517

Pub. Year:

2007

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819466365 [0819466360]

Language:

English

Call no.:

P63600/6517

Type:

Conference Proceedings

Details

TDL ID:	ZA00046824
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Emerging Lithographic Technologies
Conf. info. (Number):	2007 : 11th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2007.02.27-2007.03.01

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