EUV exposure experiment using programmed multilayer defects for refining printability simulation

EUV exposure experiment using programmed multilayer defects for refining printability simulation

Author(s):

Y. Tezuka ( Association of Super-Advanced Electronics Technologies (Japan) )

J. Cullins ( Association of Super-Advanced Electronics Technologies (Japan) )

Y. Tanaka ( Association of Super-Advanced Electronics Technologies (Japan) )

T. Hashimoto ( Association of Super-Advanced Electronics Technologies (Japan) )

I. Nishiyama ( Association of Super-Advanced Electronics Technologies (Japan) )

T. Shoki ( HOYA Corp. (Japan) )

1 more

Publication title:

Emerging lithographic technologies XI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6517

Pub. Year:

2007

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819466365 [0819466360]

Language:

English

Call no.:

P63600/6517

Type:

Conference Proceedings

Details

TDL ID:	ZA00046824
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Emerging Lithographic Technologies
Conf. info. (Number):	2007 : 11th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2007.02.27-2007.03.01

Similar Items:

1 Conference Proceedings EUVL mask substrate defect print study J. Cullins, Y. Tezuka, I. Nishiyama, T. Hashimoto, T. Shoki SPIE - The International Society of Optical Engineering	7 Conference Proceedings Phase defect observation using an EUV microscope [6151-46] Hamamoto, K., Tanaka, Y., Yoshizumi, T., Fukushima, Y., Shiotani, H., Sakaya, N., Hosoya, M, Shoki, T, Watanabe, T, … SPIE - The International Society of Optical Engineering
2 Conference Proceedings Fabrication of programmed phase defects on EUV multilayer blanks Kinoshita, T., Shoki, T., Kobayashi, H., Ohkubo, R., Usui, Y.-I., Hosoya, M., Sakaya, N., Nagarekawa, O. SPIE - The International Society of Optical Engineering	8 Conference Proceedings Selete's EUV program: progress and challenges I. Mori, O. Suga, H. Tanaka, I. Nishiyama, T. Terasawa Society of Photo-optical Instrumentation Engineers
3 Conference Proceedings Simulation analysis of printability of scratch and bump defects in EUV lithography [6151-32] Sugawara, M., Nishiyama, I. SPIE - The International Society of Optical Engineering	9 Conference Proceedings Investigation of defect repair methods for EUVL mask blanks through aerial-image simulations [5853-72] Hashimoto, T., Nishiyama, I. SPIE - The International Society of Optical Engineering
4 Conference Proceedings Impact of interface treatment with assisted ion beam on Mo-Si multilayer formation for EUVL mask blanks K. Hiruma, Y. Tanaka, S. Miyagaki, J. Cullins, I. Nishiyama SPIE - The International Society of Optical Engineering	10 Conference Proceedings Actinic detection and signal characterization of multilayer defects on EUV mask blanks Tezuka, Y., Ito, M., Terasawa, T., Tomie, T. SPIE - The International Society of Optical Engineering
5 Conference Proceedings Actinic detection and screening of multilayer defects on EUV mask blanks using dark-field imaging Tezuka, Y., Ito, M., Terasawa, T., Tomie, T. SPIE - The International Society of Optical Engineering	11 Conference Proceedings Use of programmed multilayer defects in validating a defect compensation strategy for EUV Lithography Ray-Chaudhuri,A.K., Cardinale,G.F., Fisher,A., Mangat,P.J.S., Liang,S., Sweeney,D.W. SPIE - The International Society for Optical Engineering
6 Conference Proceedings Actinic detection of multilayer defects on EUV mask blanks using LPP light source and dark-field imaging Tezuka, Y., Ito, M., Terasawa, T., Tomie, T. SPIE - The International Society of Optical Engineering	12 Conference Proceedings Study on exposure contrast of an EUV mask Hosoya, M., Shoki, T., Kinoshita, T., Sakaya, N., Nagarekawa, O. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12