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Whole wafer imprint patterning using step and flash imprint lithography: a manufacturing solution for sub-100-nm patterning

Author(s):
D. Lentz ( Molecular Imprints, Inc. (USA) )
G. Doyle ( Molecular Imprints, Inc. (USA) )
M. Miller ( Molecular Imprints, Inc. (USA) )
G. Schmidt ( Molecular Imprints, Inc. (USA) )
M. Ganapathisuramanian ( Molecular Imprints, Inc. (USA) )
X. Lu ( Molecular Imprints, Inc. (USA) )
D. Resnick ( Molecular Imprints, Inc. (USA) )
D. L. LaBrake ( Molecular Imprints, Inc. (USA) )
3 more
Publication title:
Emerging lithographic technologies XI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6517
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466365 [0819466360]
Language:
English
Call no.:
P63600/6517
Type:
Conference Proceedings

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