Nanoimprinting with SU-8 epoxy resists
- Author(s):
- D. W. Johnson ( MicroChem Corp. (USA) )
- H. Miller ( MicroChem Corp. (USA) )
- M. Kubenz ( micro resist technology GmbH (Germany) )
- F. Reuther ( micro resist technology GmbH (Germany) )
- G. Gruetzner ( micro resist technology GmbH (Germany) )
- Publication title:
- Emerging lithographic technologies XI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6517
- Pub. Year:
- 2007
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819466365 [0819466360]
- Language:
- English
- Call no.:
- P63600/6517
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
mr-NIL 6000: new epoxy-based curing resist for efficient processing in combined thermal and UV nanoimprint lithography
SPIE - The International Society of Optical Engineering |
7
Conference Proceedings
Chemical and mechanical properties of UV-cured nanoimprint resists and release layer interactions
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |
8
Conference Proceedings
Low-viscosity and fast-curing polymer system for UV-based nanoimprint lithography and its processing
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
9
Conference Proceedings
A Vinyl ether resist system for UV -cured nanoimprint lithography [6153-47]
SPIE - The International Society of Optical Engineering |
4
Conference Proceedings
Alternative approach to transparent stamps for UV-based nanoimprint lithography: techniques and materials
Society of Photo-optical Instrumentation Engineers |
10
Conference Proceedings
Effect of humidity on deprotection kinetics in chemically amplified resists
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
11
Conference Proceedings
B Adhesion between template materials and UV -cured nanoimprint resists [6153-48]
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
12
Conference Proceedings
Advances in fabrication of x-ray masks based on vitreous carbon using a new UV sensitive positive resist
Society of Photo-optical Instrumentation Engineers |