Photocurable silicon-based materials for imprinting lithography
- Author(s):
J. Hao ( The Univ. of Texas at Austin (USA) ) M. W. Lin ( The Univ. of Texas at Austin (USA) ) F. Palmieri ( The Univ. of Texas at Austin (USA) ) Y. Nishimura ( The Univ. of Texas at Austin (USA) ) H. Chao ( The Univ. of Texas at Austin (USA) ) M. D. Stewart ( The Univ. of Texas at Austin (USA) ) A. Collins ( The Univ. of Texas at Austin (USA) ) K. Jen ( The Univ. of Texas at Austin (USA) ) C. G. Willson ( The Univ. of Texas at Austin (USA) ) - Publication title:
- Emerging lithographic technologies XI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6517
- Pub. Year:
- 2007
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819466365 [0819466360]
- Language:
- English
- Call no.:
- P63600/6517
- Type:
- Conference Proceedings
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