Design of metal slits for higher harmonic fringe patterns generated with surface plasmon interference lithography

Design of metal slits for higher harmonic fringe patterns generated with surface plasmon interference lithography

Author(s):

Y. Lee ( Yonsei Univ. (South Korea) )
S. Park ( Yonsei Univ. (South Korea) )
E. Lee ( Yonsei Univ. (South Korea) )
K. Kim ( Yonsei Univ. (South Korea) )
J. W. Hahn ( Yonsei Univ. (South Korea) )

Publication title:

Emerging lithographic technologies XI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6517

Pub. Year:

2007

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819466365 [0819466360]

Language:

English

Call no.:

P63600/6517

Type:

Conference Proceedings

Details

TDL ID:	ZA00046824
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Emerging Lithographic Technologies
Conf. info. (Number):	2007 : 11th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2007.02.27-2007.03.01

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