Application of the Energetiq EQ-10 electrodeless Z-Pinch EUV light source in outgassing and exposure of EUV photoresist

Author(s):

P. A. Blackborow ( Energetiq Technology, Inc. (USA) )

D. S. Gustafson ( Energetiq Technology, Inc. (USA) )

D. K. Smith ( Energetiq Technology, Inc. (USA) )

M. M. Besen ( Energetiq Technology, Inc. (USA) )

S. F. Horne ( Energetiq Technology, Inc. (USA) )

R. J. D'Agostino ( Energetiq Technology, Inc. (USA) )

Y. Minami ( Litho Tech Japan Co. (Japan) )

G. Denbeaux ( SUNY, Albany (USA) )

3 more

Publication title:

Emerging lithographic technologies XI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6517

Pub. Year:

2007

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819466365 [0819466360]

Language:

English

Call no.:

P63600/6517

Type:

Conference Proceedings