Focused ion beam nano patterning for fabrications of III-nitride light emitting diodes

Focused ion beam nano patterning for fabrications of III-nitride light emitting diodes

Author(s):

M. Y. Kim ( Samsung Electro-Mechanics (South Korea) )

Y. C. Park ( Samsung Electro-Mechanics (South Korea) )

S. S. Hong ( Samsung Electro-Mechanics (South Korea) )

B. K. Kim ( Samsung Electro-Mechanics (South Korea) )

D. W. Kim ( Samsung Electro-Mechanics (South Korea) )

D. Y. Lee ( Samsung Electro-Mechanics (South Korea) )

1 more

Publication title:

Emerging lithographic technologies XI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6517

Pub. Year:

2007

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819466365 [0819466360]

Language:

English

Call no.:

P63600/6517

Type:

Conference Proceedings

Details

TDL ID:	ZA00046824
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Emerging Lithographic Technologies
Conf. info. (Number):	2007 : 11th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2007.02.27-2007.03.01

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