An electrical defectivity characterization of wafers imprinted with step and flash imprint lithography

An electrical defectivity characterization of wafers imprinted with step and flash imprint lithography

Author(s):

W. J. Dauksher ( Motorola Labs. (USA) )

N. V. Le ( Motorola Labs. (USA) )

K. A. Gehoski ( Motorola Labs. (USA) )

E. S. Ainley ( Motorola Labs. (USA) )

K. J. Nordquist ( Motorola Labs. (USA) )

N. Joshi ( Florida International Univ. (USA) )

1 more

Publication title:

Emerging lithographic technologies XI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6517

Pub. Year:

2007

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819466365 [0819466360]

Language:

English

Call no.:

P63600/6517

Type:

Conference Proceedings

Details

TDL ID:	ZA00046824
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Emerging Lithographic Technologies
Conf. info. (Number):	2007 : 11th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2007.02.27-2007.03.01

Similar Items:

1 Conference Proceedings Evaluation of FIB and e-beam repairs for implementation on step and flash imprint lithography templates [6151-50] Young, S. R., Dauksher, W. J., Nordquist, K. J., Ainley, E. S., Gehoski, K. A., Graupera, A. A., Moriarty, M. H. SPIE - The International Society of Optical Engineering	7 Conference Proceedings Analysis of critical dimension uniformity for Step and Flash imprint lithography Mancini, D.P., Gehoski, K.A., Dauksher, W.J., Nordquist, K.J., Resnick, D.J., Schumaker, P., McMackin, I. SPIE-The International Society for Optical Engineering
2 Conference Proceedings Critical dimension and image placement issues for step and flash imprint lithography templates Nordquist, K.J., Mancini, D.P., Dauksher, W.J., Ainley, E.S., Gehoski, K.A., Resnick, D.J., Masnyj, Z.S., Mangat, P.J.S. SPIE-The International Society for Optical Engineering	8 Conference Proceedings Imprint technology: a potential low-cost solution for sub-45 nm device applications [6151-93] Le, N. V., Dauksher, W. J., Gehoski, K. A., Nordquist, K. J., Ainley, E., Mangat, P. SPIE - The International Society of Optical Engineering
3 Conference Proceedings High-resolution templates for step and flash imprint lithography Resnick, D.J., Dauksher, W.J., Mancini, D.P., Nordquist, K.J., Ainley, E.S., Gehoski, K.A., Baker, J.H., Bailey, T.C., … SPIE-The International Society for Optical Engineering	9 Conference Proceedings Template fabrication for sub-80-nm contact hole patterning using step and flash imprint lithography Mancini, D.P., Gehoski, K.A., Dauksher, W.J., Nordquist, K.J., Resnick, D.J., Schumaker, P., McMackin, I. SPIE - The International Society of Optical Engineering
4 Conference Proceedings New methods for fabricating step and flash imprint lithography templates Resnick, D.J., Bailey, T.C., Mancini, D.P., Nordquist, K.J., Dauksher, W.J., Ainley, E.S., Talin, A., Gehoski, K.A., … SPIE-The International Society for Optical Engineering	10 Conference Proceedings Employing Step-and-Flash imprint lithography for gate-level patterning of a MOSFET device Smith, B.J., Stacey, N.A., Donnelly, J.P., Onsongo, D.M., Bailey, T.C., Mackay, C.J., Resnick, D.J., Dauksher, W.J., … SPIE-The International Society for Optical Engineering
5 Conference Proceedings Sub-80-nm contact hole patterning using Step and Flash Imprint Lithography Mancini, D.P., Le, N., Gehoski, K.A., Young, S., Dauksher, W.J., Nordquist, K.J., Resnick, D.J. SPIE - The International Society of Optical Engineering	11 Conference Proceedings Inspection and repair issues for Step-and-Flash Imprint Lithography templates Nordquist, K. J., Dauksher, W. J., Mancini, D. P., Resnick, D. J., Hess, H. F., Pettibone, D. W., Adler, D., Bertsche, … SPIE - The International Society of Optical Engineering
6 Conference Proceedings Advances in Step and Flash imprint lithography Johnson, S.C., Bailey, T.C., Dickey, M.D., Smith, B.J., Kim, E.K., Jamieson, A.T., Stacey, N.A., Ekerdt, J.G., Willson, … SPIE-The International Society for Optical Engineering	12 Conference Proceedings Defect inspection for imprint lithography using a die to database electron beam verification system [6151-22] Myron, L. J, Thompson, McMackin, I., Resnick, D. J., Kitamura, T., Hasebe, T, Nakazawa, S, Tokumoto, T., Ainley, E., … SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12