Development of optics for EUV lithography tools

Author(s):

K. Murakami ( Nikon Corp. (Japan) )

T. Oshino ( Nikon Corp. (Japan) )

H. Kondo ( Nikon Corp. (Japan) )

H. Chiba ( Nikon Corp. (Japan) )

H. Komatsuda ( Nikon Corp. (Japan) )

K. Nomura ( Nikon Corp. (Japan) )

H. Iwata ( Nikon Corp. (Japan) )

2 more

Publication title:

Emerging lithographic technologies XI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6517

Pub. Year:

2007

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819466365 [0819466360]

Language:

English

Call no.:

P63600/6517

Type:

Conference Proceedings