Critical parameters influencing the EUV-induced damage of Ru-capped multilayer mirrors

Author(s):

S. B. Hill ( National Institute of Standards and Technology (USA) )

I. Ermanoski ( National Institute of Standards and Technology (USA) )

C. Tarrio ( National Institute of Standards and Technology (USA) )

T. B. Lucatorto ( National Institute of Standards and Technology (USA) )

T. E. Madey ( Rutgers Univ. (USA) )

S. Bajt ( Lawrence Livermore National Lab. (USA) )

M. Fang ( Intel Corp. (USA) )

M. Chandhok ( Intel Corp. (USA) )

3 more

Publication title:

Emerging lithographic technologies XI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6517

Pub. Year:

2007

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819466365 [0819466360]

Language:

English

Call no.:

P63600/6517

Type:

Conference Proceedings