Atomic hydrogen cleaning of Ru-capped EUV multilayer mirror

Author(s):

K. Motai ( EUV Process Technology Research Laboratory, ASET (Japan) )

H. Oizumi ( EUV Process Technology Research Laboratory, ASET (Japan) and Kyushu Institute of Technology (Japan) )

S. Miyagaki ( EUV Process Technology Research Laboratory, ASET (Japan) )

I. Nishiyama ( EUV Process Technology Research Laboratory, ASET (Japan) )

A. Izumi ( Kyushu Institute of Technology (Japan) )

T. Ueno ( Kyushu Institute of Technology (Japan) )

Y. Miyazaki ( Kyushu Institute of Technology (Japan) )

A. Namiki ( Kyushu Institute of Technology (Japan) )

3 more

Publication title:

Emerging lithographic technologies XI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6517

Pub. Year:

2007

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819466365 [0819466360]

Language:

English

Call no.:

P63600/6517

Type:

Conference Proceedings