Study of the thermal characteristic of x-ray mask during short-pulsed exposure

Study of the thermal characteristic of x-ray mask during short-pulsed exposure

Author(s):

H. Shang ( Shanghai Maritime Univ. (China) )
Y. Wang ( Beijing Univ. of Aeronautics and Astronautics (China) )

Publication title:

Sixth International Symposium on Instrumentation and Control Technology: Signal Analysis, Measurement Theory, Photo -Electronic Technology, and Artificial Intelligence : 13-15 October 2006, Beijing, China

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6357

Pub. Year:

2006

Pt.:

2

Paper no.:

63573M

Page(from):

63573M-1

Page(to):

63573M-5

Pages:

5

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819464521 [081946452X]

Language:

English

Call no.:

P63600/6357

Type:

Conference Proceedings

Details

TDL ID:	ZA00046714
Series ID:	PA00000029
Conf. info. (Name):	International Symposium on Instrumentation and Control Technology
Conf. info. (Number):	2006 : 6th
Conf. info. (Venue):	Beijing, China
Conf. info. (Date):	2006.10.13-2006.10.15
Note for article:	63573M ; 6th International Symposium on Instrumentation and Control Technology, 13-15 October 2006, Beijing, China

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