Ultrafast phase transition of Si by femtosecond laser pulse irradiation

Ultrafast phase transition of Si by femtosecond laser pulse irradiation

Author(s):

M. Fujita ( Institute for Laser Technology (Japan) )
Y. Izawa ( Osaka Univ. (Japan) )
M. Hashida ( Kyoto Univ. (Japan) )
Y. Setsuhara ( Osaka Univ. (Japan) )
C. Yamanaka ( Osaka Univ. (Japan) )

Publication title:

XVI International Symposium on Gas Flow, Chemical Lasers,and High-Power-Lasers : 4-8 September 2006, Gmunden, Austria

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6346

Pub. Year:

2007

Paper no.:

63463S

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819464309 [0819464309]

Language:

English

Call no.:

P63600/6346

Type:

Conference Proceedings

Details

TDL ID:	ZA00046712
Series ID:	PA00000029
Conf. info. (Name):	International Symposium on Gas Flow, Chemical Lasers,and High-Power Lasers
Conf. info. (Number):	2006 : 16th
Conf. info. (Venue):	Gmunden, Austria
Conf. info. (Date):	2006.09.04-2006.09.08
Note for article:	63463S ; 16th International Symposium on Gas Flow, Chemical Lasers,and High-Power-Lasers, 4-8 September 2006, Gmunden, Austria

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