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Challenges and solutions for trench lithography beyond 65nm node [6156-60]

Author(s):
Lu, Z. ( Texas Instruments Inc. (USA) )
Ho, C.-C. ( Texas Instruments Inc. (USA) )
Mason, M. ( Texas Instruments Inc. (USA) )
Anderson, A. ( Texas Instruments Inc. (USA) )
Mckee, R. ( Texas Instruments Inc. (USA) )
Jackson, R. ( Texas Instruments Inc. (USA) )
Zhu, C. ( Texas Instruments Inc. (USA) )
Terry, M. ( Texas Instruments Inc. (USA) )
3 more
Publication title:
Design and process integration for microelectronic manufacturing IV : 23-24 February, 2006, San Jose, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6156
Pub. Year:
2006
Page(from):
615617
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461995 [0819461997]
Language:
English
Call no.:
P63600/6156
Type:
Conference Proceedings

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