Challenges and solutions for trench lithography beyond 65nm node [6156-60]
- Author(s):
Lu, Z. ( Texas Instruments Inc. (USA) ) Ho, C.-C. ( Texas Instruments Inc. (USA) ) Mason, M. ( Texas Instruments Inc. (USA) ) Anderson, A. ( Texas Instruments Inc. (USA) ) Mckee, R. ( Texas Instruments Inc. (USA) ) Jackson, R. ( Texas Instruments Inc. (USA) ) Zhu, C. ( Texas Instruments Inc. (USA) ) Terry, M. ( Texas Instruments Inc. (USA) ) - Publication title:
- Design and process integration for microelectronic manufacturing IV : 23-24 February, 2006, San Jose, California, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6156
- Pub. Year:
- 2006
- Page(from):
- 615617
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461995 [0819461997]
- Language:
- English
- Call no.:
- P63600/6156
- Type:
- Conference Proceedings
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