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Lithography window check before mask tape-out in sub-O.18um technology [6156-31]

Author(s):
Lu, M. ( Shanghai Institute of Microsystem And Information Technology (China), Grace Semiconductor Manufacturing Corp. (China), and Graduate School of the Chinese Academy of Sciences (China) )
King, D. ( Grace Semiconductor Manufacturing Corp. (China) )
Li, F. ( Grace Semiconductor Manufacturing Corp. (China) )
Mao, Z. ( Grace Semiconductor Manufacturing Corp. (China) )
Liang, C. ( Grace Semiconductor Manufacturing Corp. (China) )
Melvin III, L. S. ( Synopsys, Inc. (USA) )
1 more
Publication title:
Design and process integration for microelectronic manufacturing IV : 23-24 February, 2006, San Jose, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6156
Pub. Year:
2006
Page(from):
61560X
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461995 [0819461997]
Language:
English
Call no.:
P63600/6156
Type:
Conference Proceedings

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