Lithography window check before mask tape-out in sub-O.18um technology [6156-31]
- Author(s):
Lu, M. ( Shanghai Institute of Microsystem And Information Technology (China), Grace Semiconductor Manufacturing Corp. (China), and Graduate School of the Chinese Academy of Sciences (China) ) King, D. ( Grace Semiconductor Manufacturing Corp. (China) ) Li, F. ( Grace Semiconductor Manufacturing Corp. (China) ) Mao, Z. ( Grace Semiconductor Manufacturing Corp. (China) ) Liang, C. ( Grace Semiconductor Manufacturing Corp. (China) ) Melvin III, L. S. ( Synopsys, Inc. (USA) ) - Publication title:
- Design and process integration for microelectronic manufacturing IV : 23-24 February, 2006, San Jose, California, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6156
- Pub. Year:
- 2006
- Page(from):
- 61560X
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461995 [0819461997]
- Language:
- English
- Call no.:
- P63600/6156
- Type:
- Conference Proceedings
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