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Impact of process variation on 65nm across-chip Iinewidth variation [6156-64]

Author(s):
Hong, L. ( Mentor Graphics Corp. (USA) )
Brist, T. ( Mentor Graphics Corp. (USA) )
LaCour, P. ( Mentor Graphics Corp. (USA) )
Sturtevant, J. ( Mentor Graphics Corp. (USA) )
Niehoff, M. ( Mentor Graphics Corp. (Germany) )
Niedermaier, P. ( Infineon Technologies AG (Germany) )
1 more
Publication title:
Design and process integration for microelectronic manufacturing IV : 23-24 February, 2006, San Jose, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6156
Pub. Year:
2006
Page(from):
61560Q
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461995 [0819461997]
Language:
English
Call no.:
P63600/6156
Type:
Conference Proceedings

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