Improving model-based optical proximity correction accuracy using improved process data gen~ration [6149-30]

Improving model-based optical proximity correction accuracy using improved process data gen~ration [6149-30]

Author(s):

Lu, M. ( Shanghai Institute of Microsystem and Graduate School of the Chinese Academy of Sciences (China), and Graduate School of the Chinese Academy of Sciences (China) )
King, D. ( Graduate School of the Chinese Academy of Sciences (China) )
Liang, C. ( Graduate School of the Chinese Academy of Sciences (China) )
Melvin, L. S. III ( Synopsys, Inc. (USA) )

Publication title:

2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6149

Pub. Year:

2006

Page(from):

61490U

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819461889 [0819461881]

Language:

English

Call no.:

P63600/6149

Type:

Conference Proceedings

Details

TDL ID:	ZA00016428
Series ID:	PA00000029
Conf. info. (Name):	International Symposium on Advanced Optical Manufacturing and Testing Technologies
Conf. info. (Number):	2005 : 2nd
Conf. info. (Venue):	Xian, China
Conf. info. (Date):	2005.11.02-2005.11.05

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