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Second level printing of advanced phase shift masks using DUV laser lithography [5853-93]

Author(s):
Howard, C.
Park, K.-T. ( DuPont Photomasks, Inc. (USA) )
Scherer, M.
Stankovic, S.
Cantrell, R.
Herrmann, M. ( Advanced Mask Technology Ctr. GmbH and Co. KG (Germany) )
1 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology XII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5853
Pub. Year:
2005
Pt.:
2
Page(from):
1021
Page(to):
1030
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819458537 [0819458538]
Language:
English
Call no.:
P63600/5853
Type:
Conference Proceedings

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