Blank Cover Image

Image placement of large window-size membrane for EPL and LEEPL mask [5853-80]

Author(s):
Eguchi, H.
Sumida, T.
Susa, T.
Negishi, Y.
Kurosu, T.
Yoshii, T.
Yamazaki, T.
Yotsui, K.
Sugimura, H.
Tamura, A. ( Toppan Printing Co., Ltd. (Japan) )
5 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology XII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5853
Pub. Year:
2005
Pt.:
2
Page(from):
910
Page(to):
920
Pages:
11
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819458537 [0819458538]
Language:
English
Call no.:
P63600/5853
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Global image placement of LEEPL mask

Eguchi, H., Susa, T., Sumida, T., Kurosu, T., Yoshii, T., Yotsui, K., Sugimura, H., Itoh, K., Tamura, A.

SPIE - The International Society of Optical Engineering
7 Conference Proceedings 200-mm EPL stencil mask fabrication by using SOI substrate

Sugimura, H., Eguchi, H., Yoshii, T., Tamura, A.

SPIE-The International Society for Optical Engineering
2 Conference Proceedings Stencil pattern accuracy of EPL masks [5853-77]

Sugimura, H., Yamazaki, T., Susa, T., Negishi, Y., Yoshii, T., Eguchi, H., Tamura, A.

SPIE - The International Society of Optical Engineering
8 Conference Proceedings Resolution improvement of EPL stencil mask using thin membrane [6151-52]

Sugimura, H., Eguchi, H., Norimoto, M., Negishi, Y., Yonekura, I., Ito, K., Tamura, A., Koba, F., Arimoto, H

SPIE - The International Society of Optical Engineering
3 Conference Proceedings Low-stress stencil masks using SOI substrates for EPL and LEEPL

Eguchi, H., Kurosu, T., Yoshii, T., Sugimura, H., Itoh, K., Tamura, A.

SPIE-The International Society for Optical Engineering
9 Conference Proceedings Low-stress stencil masks using a doping method

Eguchi, H., Kurosu, T., Yoshii, T., Sugimura, H., Itoh, K., Tamura, A.

SPIE - The International Society of Optical Engineering
4 Conference Proceedings Advanced image placement performance for the current EPL masks [6151-53]

Eguchi, H., Sugimura, H., Koike, K., Sakaue, H., Arimoto, H., Ogawa, K., Susa, T., Kunitani, S., Kurosu, T., Yoshii, T., …

SPIE - The International Society of Optical Engineering
10 Conference Proceedings Defect inspection strategy of LEEPL masks [5853-82]

Yonekura, I., Kunitani, S., Susa, T., Itoh, K., Tamura, A., Maruyama, S.

SPIE - The International Society of Optical Engineering
5 Conference Proceedings Practical LEEPL masks for sub-65-nm node

Yotsui, K., Sumida, T., Negishi, Y., Yoshii, T., Tamura, A.

SPIE - The International Society of Optical Engineering
11 Conference Proceedings Feedforward correction of mask image placement for proximity electron lithography

Omori, S., Nohdo, S., Motohashi, T., Kitagawa, T., Susa, T., Yotsui, K., Itoh, K., Tamura, A.

SPIE - The International Society of Optical Engineering
6 Conference Proceedings Local IP evaluations of EPL reticle with 4 mm-sq Si membranes [5853-118]

Koike, K., Sakaue, H., Arimoto, H., Yamazaki, T., Sugimura, H., Susa, T., Itoh, K., Tamura, A.

SPIE - The International Society of Optical Engineering
12 Conference Proceedings Development of positive-tone chemically amplified resist for LEEPL mask making [5853-79]

Negishi, Y., Takeshi, K., Yoshii, T., Tanaka, K., Okumoto, Y.

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12