Blank Cover Image

A study for polarized illumination effects in photo resist [5853-65]

Author(s):
Publication title:
Photomask and Next-Generation Lithography Mask Technology XII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5853
Pub. Year:
2005
Pt.:
2
Page(from):
800
Page(to):
807
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819458537 [0819458538]
Language:
English
Call no.:
P63600/5853
Type:
Conference Proceedings

Similar Items:

Bai, M., Lei, J., Zhang, L., Shiely, J. P.

SPIE - The International Society of Optical Engineering

7 Conference Proceedings Simulations of immersion lithography

Min Bai, Junjiang Lei, Lin Zhang, James P. Shiely

SPIE - The International Society of Optical Engineering

Lei, J., Bai, M., Shiely, J., Zhang, L.

SPIE - The International Society of Optical Engineering

Yan, Q., Melvin III, L. S., Shiely, J. P.

SPIE - The International Society of Optical Engineering

Junjiang Lei, Min Bai, Jim Shiely, Lin Zhang

SPIE - The International Society of Optical Engineering

L. Zavyalova, H. Song, K. Lucas, Q. Zhang, J. Shiely

Society of Photo-optical Instrumentation Engineers

Bai, M., Lei, J., Zhang, L., Shiely, J. P.

SPIE - The International Society of Optical Engineering

Kim, J., Wang, L., Zhang, D., Tang, Z.

SPIE - The International Society of Optical Engineering

H. Song, Q. Zhang, J. Shiely

Society of Photo-optical Instrumentation Engineers

G.Q. Li, L.J. Zheng, Z.F. Zhang, H.X. Li, M.F. Hashmi, Q. Cai, B. He

Trans Tech Publications

Q. Zhang, H. Song, K. Lucas, B. Ward, J. Shiely

Society of Photo-optical Instrumentation Engineers

Hsu, S., Van Den Broeke, D., Chen, J. F., Park, J., Hsu, M. C. W.

SPIE - The International Society of Optical Engineering

1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12