ArF photoresist parameter optimization for mask error enhancement factor reduction [5853-60]
- Author(s):
Lee, C. H. Han, S. Park, K. S. Yoon, S. ( Samsung Electronics Co. (South Korea) ) Kang, H. Y. Oh, H. W. Lee, J. E. ( Hanyang Univ. (South Korea) ) Kim, Y. H. Kim, T. S. ( Samsung Electronics Co. (South Korea) ) Oh, H.-K. ( Hanyang Univ. (South Korea) ) - Publication title:
- Photomask and Next-Generation Lithography Mask Technology XII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5853
- Pub. Year:
- 2005
- Pt.:
- 2
- Page(from):
- 749
- Page(to):
- 756
- Pages:
- 8
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819458537 [0819458538]
- Language:
- English
- Call no.:
- P63600/5853
- Type:
- Conference Proceedings
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