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ArF photoresist parameter optimization for mask error enhancement factor reduction [5853-60]

Author(s):
Lee, C. H.
Han, S.
Park, K. S.
Yoon, S. ( Samsung Electronics Co. (South Korea) )
Kang, H. Y.
Oh, H. W.
Lee, J. E. ( Hanyang Univ. (South Korea) )
Kim, Y. H.
Kim, T. S. ( Samsung Electronics Co. (South Korea) )
Oh, H.-K. ( Hanyang Univ. (South Korea) )
5 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology XII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5853
Pub. Year:
2005
Pt.:
2
Page(from):
749
Page(to):
756
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819458537 [0819458538]
Language:
English
Call no.:
P63600/5853
Type:
Conference Proceedings

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