Multi-layer masks: manufacturability considerations [5853-49]

Multi-layer masks: manufacturability considerations [5853-49]

Author(s):: Balasinski, A. ( Cypress Semiconductor (USA) )
Publication title:: Photomask and Next-Generation Lithography Mask Technology XII
Title of ser.:: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:: 5853
Pub. Year:: 2005
Pt.:: 2
Page(from):: 651
Page(to):: 658
Pages:: 8
Pub. info.:: Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:: 0277786X
ISBN:: 9780819458537 [0819458538]
Language:: English
Call no.:: P63600/5853
Type:: Conference Proceedings

Details

TDL ID:	ZA00016424
Series ID:	PA00000029
Conf. info. (Name):	Photomask and next-generation lithography mask technology
Conf. info. (Number):	2005 : 12th
Conf. info. (Venue):	Yokohama, Japan
Conf. info. (Date):	2005.04.13-2005.04.15

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