Pattern based mask process correction: impact on data quality and mask writing time [5853-38]
- Author(s):
- Sahouria, E.
- Bowhill, A.
- Schulze, S. ( Mentor Graphics Corp. (USA) )
- Publication title:
- Photomask and Next-Generation Lithography Mask Technology XII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5853
- Pub. Year:
- 2005
- Pt.:
- 2
- Page(from):
- 564
- Page(to):
- 573
- Pages:
- 10
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819458537 [0819458538]
- Language:
- English
- Call no.:
- P63600/5853
- Type:
- Conference Proceedings
Similar Items:
SPIE - The International Society of Optical Engineering |
7
Conference Proceedings
Distributed computing in mask data preparation for 45-nm node and below [6349-142]
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
8
Conference Proceedings
A user-programmable link between data preparation and mask manufacturing equipment
Society of Photo-optical Instrumentation Engineers |
3
Conference Proceedings
The prospects for hierarchical data processing with growing complexity of the post-tapeout flow
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
10
Conference Proceedings
Interaction of RET and MDP: optimization for reducing the mask writing time
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
11
Conference Proceedings
Optimization of the data preparation for variable-shape beam mask writing machines
SPIE-The International Society for Optical Engineering |
6
Conference Proceedings
Optimization of data handling prior to fracturing for reduction of mask writing time
SPIE - The International Society of Optical Engineering |
12
Conference Proceedings
GDS-based mask data preparation flow. Data volume containment by hierarchical data processing
SPIE-The International Society for Optical Engineering |